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Rotatable Ag Sputtering Target
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Product name
Rotatable Ag Sputtering Target
Mainly used in Low-E coated glass, thin film solar industry,TFT-LCD, semiconductor electronics
Serial number
Affiliate classification
Rotatable Target
Weight
0.00
Retail price
0.00
Yuan
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Quantity
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Product description
Product parameters
≤200
Fe
≤50
Cu
≤30
Maximum impurity content (unit: ppm, total impurity content ≤ 100ppm)
Al
≤10
O
≤500
N
Application:
Mainly used in Low-E coated glass, thin film solar industry,
TFT-LCD, semiconductor electronics
Maximum processing size:
Length L: 4000MM Thickness T: 6-13MM
Straight, dog bone type
Customized according to customer requirements
Rotatable Ag Sputtering Target
≥ 10.4g/cm³(≥99%)
Chemical Formula:
Molding:
Density:
Purity:
Ag
Spraying
≥ 99.99%
产品化学成分和物理性能：
Product chemical composition and physical properties:
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