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Magnetron sputtering target

Number of views:
1012

Rotatable Ag Target

Chemical formula: Ag
Molding process: spraying
Density: ≥ 10.4g / cm³ (≥99%)
Purity: ≥ 99.99%
Application: Mainly used in Low-E coated glass, thin film solar industry, TFT-LCD, semiconductor electronics
Maximum processing size: Length: 4000MM Thickness: 6-13MM, straight, dog bone, customized according to customer requirements
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Number of views:
1012
Product serial number
前台产品分类:
Metal Target
Quantity
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+
Stock:
1
Product description
Parameters

Ag

喷涂

≥ 10.4g/cm³(≥99%)

≥ 99.99%

化学式: 

成型工艺: 

密度:  

纯度:   

≤200

最大杂质含量(单位: ppm, 总杂质含量≤100ppm)

Fe

≤50

Cu

≤30

≤500

N

Al

≤10

O

 

最大加工尺寸: 

长度L: 4000MM   厚度T: 6-13MM

直型、狗骨型

按客户要求定做

 

旋转银靶 

 

产品化学成分和物理性能:

应用: 

主要用于Low-E镀膜玻璃, 薄膜太阳能行业, TFT-LCD, 半导体电子

 
 
 

Rotatable Ag Sputtering Target

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