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Magnetron sputtering target
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1012
Rotatable Ag Target
Molding process: spraying
Density: ≥ 10.4g / cm³ (≥99%)
Purity: ≥ 99.99%
Application: Mainly used in Low-E coated glass, thin film solar industry, TFT-LCD, semiconductor electronics
Maximum processing size: Length: 4000MM Thickness: 6-13MM, straight, dog bone, customized according to customer requirements
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前台产品分类:
Metal Target
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Product description
Parameters
Ag
喷涂
≥ 10.4g/cm³(≥99%)
≥ 99.99%
化学式:
成型工艺:
密度:
纯度:
≤200
最大杂质含量（单位: ppm, 总杂质含量≤100ppm）
Fe
≤50
Cu
≤30
≤500
N
Al
≤10
O
最大加工尺寸：
长度L: 4000MM 厚度T: 6-13MM
直型、狗骨型
按客户要求定做
旋转银靶
产品化学成分和物理性能：
应用:
主要用于Low-E镀膜玻璃, 薄膜太阳能行业, TFT-LCD, 半导体电子
Rotatable Ag Sputtering Target
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Time of issue:2020-05-09 00:00:00
