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电子浆料

Magnetron sputtering target

Number of views:
1016

Rotatable ITO Target

Chemical formula: In2O3: SnO2
Molding process: cold isostatic pressing + high temperature sintering + help setting
Density: ≥ 7.13g / cm3 (≥99.7%)
Purity: ≥ 99.99%
Application: Mainly used in TN, STN LCD and touch screen, semiconductor electronics, thin film solar industry, architectural glass
Maximum processing size: Length: 530MM, thickness: 6-13MM, straight type, dog bone type, customized according to customer requirements
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Number of views:
1016
Product serial number
前台产品分类:
Ceramic Target
Quantity
-
+
Stock:
1
Product description
Parameters

纯度:   

In2O3:SnO2

冷等静压+高温烧结+帮定

≥ 7.13g/cm3(≥99.7%)

≥ 99.99%

化学式: 

成型工艺: 

密度:  

≤10 

最大杂质含量(单位: ppm,总杂质含量≤100ppm)

Fe

≤10

Ni

≤10

Cr

≤10

Si

≤20

Pd

≤10

Cu

最大加工尺寸: 

长度L: 530MM   厚度T: 6-13MM

直型、狗骨型

按客户要求定做

Rotatable ITO Sputtering Target

 

旋转氧化铟锡靶 

产品化学成分和物理性能:

应用: 

主要用于TN,STN型液晶显示器和触摸屏,半导体电子,薄膜太阳能行业,建筑玻璃

 
 
 
 
 
Keyword:
陶瓷靶材
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Time of issue:2020-05-09 00:00:00

 

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Time of issue:2020-05-06 00:00:00