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Magnetron sputtering target
Number of views:
1016
Rotatable ITO Target
Molding process: cold isostatic pressing + high temperature sintering + help setting
Density: ≥ 7.13g / cm3 (≥99.7%)
Purity: ≥ 99.99%
Application: Mainly used in TN, STN LCD and touch screen, semiconductor electronics, thin film solar industry, architectural glass
Maximum processing size: Length: 530MM, thickness: 6-13MM, straight type, dog bone type, customized according to customer requirements
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Number of views:
1016
Product serial number
前台产品分类:
Ceramic Target
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Product description
Parameters
纯度:
In2O3:SnO2
冷等静压+高温烧结+帮定
≥ 7.13g/cm3（≥99.7%）
≥ 99.99%
化学式:
成型工艺:
密度:
≤10
最大杂质含量（单位: ppm，总杂质含量≤100ppm）
Fe
≤10
Ni
≤10
Cr
≤10
Si
≤20
Pd
≤10
Cu
最大加工尺寸：
长度L: 530MM 厚度T: 6-13MM
直型、狗骨型
按客户要求定做
Rotatable ITO Sputtering Target
旋转氧化铟锡靶
产品化学成分和物理性能：
应用:
主要用于TN，STN型液晶显示器和触摸屏，半导体电子，薄膜太阳能行业，建筑玻璃
Keyword:
陶瓷靶材
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Time of issue:2020-05-09 00:00:00
