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Rotatable ITO Sputtering Target
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Product name
Rotatable ITO Sputtering Target
Mainly used for TN, STN type liquid crystal display and touch screen, semiconductor electronics, thin film solar industry, architectural glass
Serial number
Affiliate classification
Rotatable Target
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Product description
Product parameters
≤10
Ni
≤10
Maximum impurity content (unit: ppm, total impurity content ≤ 100ppm)
Cr
≤10
Cu
≤10
Si
≤10
Pd
≤20
Fe
Application:
Mainly used for TN, STN type liquid crystal display and touch screen, semiconductor electronics, thin film solar industry, architectural glass
Maximum processing size:
Length L: 530MM Thickness T: 6-13MM
Straight, dog bone type
Customized according to customer requirements
Rotatable ITO Sputtering Target
≥ 7.13g/cm3（≥99.7%）
Chemical Formula:
Molding:
Density:
Purity:
In2O3:SnO2
Cold isostatic pressing + high
temperature sintering + bonding
≥ 99.99%
Product chemical composition and physical properties:
产品化学成分和物理性能：
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