APPLICATIONS
Rotatable ITO Sputtering Target
Rotatable ITO Sputtering Target
Mainly used for TN, STN type liquid crystal display and touch screen, semiconductor electronics, thin film solar industry, architectural glass
≤10
Ni
≤10
Maximum impurity content (unit: ppm, total impurity content ≤ 100ppm)
Cr
≤10
Cu
≤10
Si
≤10
Pd
≤20
Fe
Application:
Mainly used for TN, STN type liquid crystal display and touch screen, semiconductor electronics, thin film solar industry, architectural glass
Maximum processing size:
Length L: 530MM Thickness T: 6-13MM
Straight, dog bone type
Customized according to customer requirements
Rotatable ITO Sputtering Target
≥ 7.13g/cm3(≥99.7%)
Chemical Formula:
Molding:
Density:
Purity:
In2O3:SnO2
Cold isostatic pressing + high
temperature sintering + bonding
≥ 99.99%
Product chemical composition and physical properties:
产品化学成分和物理性能: