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Rotatable ITO Sputtering Target

Rotatable ITO Sputtering Target

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Product name

Rotatable ITO Sputtering Target

Application:
Mainly used for TN, STN type liquid crystal display and touch screen, semiconductor electronics, thin film solar industry, architectural glass
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Product description
Product parameters

≤10

Ni

≤10

Maximum impurity content (unit: ppm, total impurity content ≤ 100ppm)​

Cr

≤10

Cu

≤10

Si

≤10

Pd

≤20

Fe

 

Application:

Mainly used for TN, STN type liquid crystal display and touch screen, semiconductor electronics, thin film solar industry, architectural glass

 

Maximum processing size:

Length L: 530MM Thickness T: 6-13MM

Straight, dog bone type

Customized according to customer requirements

Rotatable ITO Sputtering Target

 

≥ 7.13g/cm3(≥99.7%)

Chemical Formula:

Molding:

Density:

Purity:  

In2O3:SnO2

Cold isostatic pressing + high

temperature sintering + bonding

≥ 99.99%

Product chemical composition and physical properties:

 

产品化学成分和物理性能:

 
Corresponding parameter set not found, please add it in property template of background
暂未实现,敬请期待
暂未实现,敬请期待
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