APPLICATIONS
Planar Mo Sputtering Target
Planar Mo Sputtering Target
Widely used in solar photovoltaic, solar cells, architectural glass,automotive glass, semiconductor electronics, flat panel TV
≤30
W
≤20
As
≤40
O
≤20
Fe
≤20
C
≤20
Cu
Application:
Widely used in solar photovoltaic, solar cells, architectural glass,
automotive glass, semiconductor electronics, flat panel TV
Planar Mo Sputtering
Target
Maximum processing size:
Length L1800*2300* thickness T50MM
Customized according to customer requirements
≥ 10.2g/cm³(≥99%)
Chemical Formula:
Molding:
Density:
Purity:
Mo
Sintering
≥ 99.95%
Maximum impurity content (unit: ppm, total impurity content ≤ 500ppm)
Product chemical composition and physical properties:
产品化学成分和物理性能: