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Planar Mo Sputtering Target

Planar Mo Sputtering Target

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Product name

Planar Mo Sputtering Target

Application:
Widely used in solar photovoltaic, solar cells, architectural glass,automotive glass, semiconductor electronics, flat panel TV
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Product description
Product parameters

≤30

W

≤20

As

≤40

O

≤20

Fe

≤20

C

≤20

Cu

 

Application:

Widely used in solar photovoltaic, solar cells, architectural glass,

automotive glass, semiconductor electronics, flat panel TV

 

Planar Mo Sputtering

Target

 

Maximum processing size:

Length L1800*2300* thickness T50MM
Customized according to customer requirements

≥ 10.2g/cm³(≥99%)

Chemical Formula:

Molding:

Density:

Purity:  

Mo

Sintering

≥ 99.95%

Maximum impurity content (unit: ppm, total impurity content ≤ 500ppm)

Product chemical composition and physical properties:

 

产品化学成分和物理性能:

 
Corresponding parameter set not found, please add it in property template of background
暂未实现,敬请期待
暂未实现,敬请期待
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