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Rotatable Ag Sputtering Target
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Product name
Rotatable Ag Sputtering Target
Mainly used for Low-E coated glass, thin film solar cell electrode film system, TFT-LCD, semiconductor electronics
Serial number
Affiliate classification
Planar Target
Weight
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Retail price
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Product description
Product parameters
Cu
≤30
Maximum impurity content (unit: ppm, total impurity content ≤ 100ppm)
Al
≤40
Fe
≤30
Application:
Mainly used for Low-E coated glass, thin film solar cell electrode film system, TFT-LCD, semiconductor electronics
Maximum processing size:
Length L1900 x Width W280 x Thickness W28mm
Can be spliced in multiple pieces, customized according to customer requirements
Rotatable Ag Sputtering Target
≥10.5g/cm³（100%）
Chemical Formula:
Molding:
Density:
Purity:
Ag
Smelting-rolling
99.99%
Product chemical composition and physical properties:
产品化学成分和物理性能：
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