APPLICATIONS
Planar Cr Sputtering Target
Planar Cr Sputtering Target
Widely used in all kinds of decorative film, building automotive glass film, lithographic chrome film
Maximum processing size:
Length L1900MM x Width W350 x Thickness T30,
can be multi-piece stitching on the copper back plate,
customized according to customer requirements
Planar Cr Sputtering
Target
Application:
Widely used in all kinds of decorative film, building automotive
glass film, lithographic chrome film
≥7.15g/cm³(≥99.5%)
Chemical Formula:
Molding:
Density:
Purity:
Cr
Hot isostatic pressing
99.5%-99.99%
Maximum impurity content
(unit: ppm, total impurity content ≤ 5000ppm or 100ppm)
Fe
Al
Si
N
≤1300
≤50
≤900
≤30
≤10
≤20
≤30
≤1150
≤270
≤20
≤20
Cu
Ni
C
O
≤30
≤20
≤10
≤10
≤30
≤30
≤1100
≤1000
≤40
≤20
≤200
≤200
Product chemical composition and physical properties:
产品化学成分和物理性能: