Planar Cr Sputtering Target

Maximum processing size:

Length L1900MM x Width W350 x Thickness T30,

can be multi-piece stitching on the copper back plate,

customized according to customer requirements

Planar Cr Sputtering

Target

Application:

Widely used in all kinds of decorative film, building automotive

glass film, lithographic chrome film

≥7.15g/cm³（≥99.5%)

Chemical Formula:

Molding:

Density:

Purity:  

Cr

Hot isostatic pressing

99.5%-99.99%

Maximum impurity content

(unit: ppm, total impurity content ≤ 5000ppm or 100ppm)

Fe

Al

Si

N

≤1300

≤50

≤900

≤30

≤10

≤20

≤30

≤1150

≤270

≤20

≤20

Cu

Ni

C

O

≤30

≤20

≤10

≤10

≤30

≤30

≤1100

≤1000

≤40

≤20

≤200

≤200