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电子浆料

Magnetron sputtering target

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1008

Rotatable SiAl Target

Chemical formula: SiAl (90: 10wt% ± 2%)
Resistivity (20 ° C): ≤ 0.1Ω.cm
Molding process: spraying
Density: ≥ 2.22g / cm (≥95%)
Purity: ≥ 99.9%
Application: Used for making SiO2 film, Si3N4 film, mainly used for optical glass AR film system, LOW-E coated glass, semiconductor electronics, TFT-LCD, flat display, touch screen glass
Maximum processing size: Length: 4000MM thickness: 6-13MM, straight
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前台产品分类:
Alloy Target
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