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电子浆料

Magnetron sputtering target

Number of views:
1001

Rotatable NbOx Target

Chemical formula: Nb2Ox (4.3 <x <4.9)
Resistivity (20 ° C): ≤ 0.1Ω.cm
Molding process: spraying
Density: ≥4.3g / cm³ (≥95%)
Purity: ≥ 99.95%
Application: Mainly used for LOW-E coated glass, thin film solar cell electrode film system, TFT-LCD, semiconductor electronics
Maximum processing size: Length: 4000MM Thickness: 6-10MM, straight, dog bone type, customized according to customer requirements
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Number of views:
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前台产品分类:
Ceramic Target
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1
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Time of issue:2020-05-09 00:00:00

 

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