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电子浆料

Magnetron sputtering target

Number of views:
1010

Planar Ag target

Chemical formula: Ag
Molding process: melting-rolling
Density: ≥10.5g / cm³ (100%)
Purity: 99.99%
Application: Mainly used in Low-E coated glass, thin film solar cell electrode film system, TFT-LCD, semiconductor electronics
Maximum processing size: length L1900 * width W280 * thickness W28mm, can be spliced in multiple pieces, customized according to customer requirements
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Number of views:
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前台产品分类:
Metal Target
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Time of issue:2020-05-09 00:00:00

 

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Time of issue:2020-05-06 00:00:00