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电子浆料

Magnetron sputtering target

Number of views:
1016

Planar Mo target

Chemical formula: Mo
Molding process: sintering
Density: ≥ 10.2g / cm³ (≥99%)
Purity: ≥ 99.95%
Application: Widely used in solar photovoltaic, solar cell, architectural glass, automotive glass, semiconductor electronics, flat panel TV
Maximum processing size: length L1800 * 2300 * thickness T50MM, customized according to customer requirements
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Number of views:
1016
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前台产品分类:
Metal Target
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Stock:
1
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Time of issue:2020-05-09 00:00:00

 

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Time of issue:2020-05-06 00:00:00