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电子浆料

Magnetron sputtering target

Number of views:
1008

Planar Cr Target

Chemical formula: Cr
Purity: 99.5% -99.99%
Density: ≥7.15g / cm³ (≥99.5%)
Molding process: hot isostatic pressing
Application: Widely used in various decorative films, architectural automotive glass films, lithographic chrome plate films
Maximum processing size: Length L1900MM * Width W350 * Thickness T30, can be multi-piece splicing help on the copper backplane, according to customer requirements
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Number of views:
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前台产品分类:
Metal Target
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Time of issue:2020-05-09 00:00:00

 

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